Photolithography would be new in our instituion and i could not ask any experts there about it, thats why i turned here.
I have created a photomask using an electrolithograpy proccess and am now stuck on how to QUANTITATIVELY evaluate the physical quality of the mask. I have googled that i can check the size consistency of the paterns (digital size to printed size on mask), thats it all i know, what else should i check for? Any help would be appeciated.
We will be using the mask in contack uv photolithography to create stuctures in silicon substrate within the micrometer range. By far, google have shown results on evaluating masks based on how good is it for producing stuctures. but few result show how to evaluate a photomask before creating the structures.